MCrAl layer

US7338719B2 · kind B2 · utility

Assignees

• Siemens Aktiengesellschaft · DE
• Forschungszentrum Jülich GmbH · DE

Inventors

• Willem J. Quadakkers · Werder (Havel), DE
• Werner Stamm · Mülheim an der Ruhr, DE

Key dates

• Filing date: May 21, 2003
• Grant date: Mar 4, 2008
• Expiry date: Jul 30, 2023

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/12944
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

MCrAl layers according to prior art often display chipping of the thermally grown aluminum oxide layer (TGO) as a result of thermally induced stresses, which significantly reduces the oxidation behavior or the bonding behavior of ceramic heat insulating layers. An inventive MCrAl layer is designed in such a way that the TGO created thereon is microporous and thus allows expansion. The microporosity of the TGO is ensured by adding elements into the MCrAl layer in a targeted manner.