Manufacturing method for electrooptic device, electrooptic device, and electronic device
US7339639B2 · kind B2 · utility
16Cited by
4References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 8, 2003 |
| Grant date | Mar 4, 2008 |
| Priority date | — |
| Expiry date | Nov 5, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133555
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A transflective electrooptic device is provided with an opening formed in a colored layer provided on the reflecting section of a transflective layer. The opening has an elliptical two-dimensional shape, and can be formed, in a patterning process, by a mask pattern having a two-dimensional shape without any corners, such as an elliptical shape. Such an opening makes it possible to inhibit fluctuations in the opening shape and opening area during a patterning operation with respect to the colored layer, and reduces variations in the opening area, thereby increasing the color reproducibility of the reflective display.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.