Oscillator and method of making for atomic force microscope and other applications
US7340944B2 · kind B2 · utility
Inventors
Key dates
| Filing date | Aug 18, 2006 |
| Grant date | Mar 11, 2008 |
| Priority date | — |
| Expiry date | Aug 18, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T74/10
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A device having an oscillator such as a sensor for use in an atomic force microscope. A pair of co-axial members interconnect support structure and the oscillator for torsionally suspending the oscillator. The co-axial members are portions of a layer of silicon nitride or other material that is connected to the oscillator and support structure, which are composed of silicon or other material.A process for making a device which includes an oscillator, which includes depositing on silicon or other first material a layer of silicon nitride or other second material, forming in the first material a support structure and the oscillator, including applying an etchant which is selective for the first material to etch all the way through the first material and leave the second material substantially unetched to thereby form the at least one flexible hinge of the second material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.