Filter methods to capture a desired amount of material from a sample suspension for monolayer deposition, analysis or other uses
US7341669B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 13, 2004 |
| Grant date | Mar 11, 2008 |
| Priority date | — |
| Expiry date | Aug 4, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/25375
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention is a filter apparatus with methods to capture a desired amount of material suspended in a liquid or gas for monolayer deposition, analysis or other uses. Novel filter devices are employed to capture material which may be used for the purification or enrichment of various sample constituents or captured material may be observed or analyzed. Alternatively, particulate material may be used as a transport mechanism for proteins or chemicals which in turn may be assessed or used. The filter device employs sensors to sense pressure and adjust, halt or otherwise control sample flow. The pressure sensor essentially monitors the flow rate of sample suspension through a filter, typically responding at a predetermined pressure associated with capture of a desired amount of material on the filter. A separate valve or valve integrated with pressure sensing provides a means to adjust sample flow. Typically, pressure is used to provide a means to cause the sample suspension to flow through the filter, which is preferably a membrane filter for monolayer deposition. In some embodiments a novel syringe provides this pressure, functioning as a vacuum source. The filter apparatus…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.