Metallic coatings on silicon substrates, and methods of forming metallic coatings on silicon substrates
US7341765B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 13, 2004 |
| Grant date | Mar 11, 2008 |
| Priority date | — |
| Expiry date | Sep 16, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The invention includes methods of forming a metallic coating on a substrate which contains silicon. A metallic glass layer is formed over a silicon surface of the substrate. The invention includes methods of protecting a silicon substrate. The substrate is provided within a deposition chamber along with a deposition target. Material from the deposition target is deposited over at least a portion of the silicon substrate to form a protective layer or structure which contains metallic glass. The metallic glass comprises iron and one or more of B, Si, P and C. The invention includes structures which have a substrate containing silicon and a metallic layer over the substrate. The metallic layer contains less than or equal to about 2 weight % carbon and has a hardness of at least 9.2 GPa. The metallic layer can have an amorphous microstructure or can be devitrified to have a nanocrystalline microstructure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.