Norbornene-type monomers and polymers containing pendent lactone or sultone groups
US7341818B2 · kind B2 · utility
2Cited by
33References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2005 |
| Grant date | Mar 11, 2008 |
| Priority date | — |
| Expiry date | Jul 16, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful in making photoimagable materials. The photoimagable materials are particularly suitable for use in photoresist compositions useful in 193 and 157 nm photolithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.