System and method for writing data using an electron beam
US7342817B2 · kind B2 · utility
1Cited by
11References
13Claims
0Family size
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Key dates
| Filing date | Apr 6, 2005 |
| Grant date | Mar 11, 2008 |
| Priority date | — |
| Expiry date | May 26, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C7/005
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system for writing data using an electron beam to change the structure of a small section of a storage medium and includes at least one focused electron beam source. The duration of a write cycle of the focused electron beam source is controlled at least in part on an estimated or measured amount of charge transmitted by the focused electron beam source to the storage medium during the write cycle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.