Patent · US Expired

Method and apparatus for purification of crystal material and for making crystals therefrom and use of crystals obtained thereby

US7344595B2 · kind B2 · utility

3Cited by
5References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 24, 2005
Grant dateMar 18, 2008
Priority date
Expiry dateJul 22, 2025

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T117/108
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The method for producing single crystals includes drying crystal raw material by removing water, reaction of impurities with a scavenger, preferably a metal halide, and homogenizing the melt. The method is performed with the raw material in a melt vessel with a variable-sized through-going opening, in which drying occurs at 100° C. to 600° C. for at least 20 hours with a geometric conductance value for the through-going opening of 2.00 to 30.00 mm2; the reacting occurs at 600° C. to 1200° C. for at least nine hours with a geometric conductance value of 0.0020 to 0.300 mm2 and the homogenizing occurs at above 1400° C. for at least six hours with a geometric conductance value of 0.25 to 1.1 mm2. Alternatively the geometric conductance value is the same during drying, reacting and homogenizing and takes a value between 0.25 and 1 mm2.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.