Preferential etching method of forming microstructure for an optical waveguide
US7346250B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 30, 2007 |
| Grant date | Mar 18, 2008 |
| Priority date | — |
| Expiry date | Mar 30, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03B2203/42
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method of fabricating a microstructure for an optical waveguide such as a photonic bandgap fiber is provided. The method includes the steps of assembling a stack of capillary tubes having substantially identical dimensions, fusing and redrawing the stack into a preform having a plurality of parallel holes of equal diameter, selecting a pattern of the holes for etching in order to increase their diameter, and plugging the unselected holes at one end of the preform against the flow of a pressurized etching fluid. Such plugging of the unselected holes is accomplished applying a layer of a gel-like sealant over the end of the preform, and then pushing the sealant into the holes to form sealant plugs in all of the holes. The sealant plugs are then removed from the selected holes by punching the sealant plugs out of the selected holes. The selected holes are then etched by conducting a pressurized flow of etching fluid to the end of the preform such that etching fluid flows only through the pattern of selected holes. The resulting preform is then fused and drawn into an optical waveguide, where the pattern of etched and unetched holes may form, for example, the microstructure for a pho…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.