Method and device for determining the position of at least one point of reflection on an obstacle
US7349820B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 2, 2004 |
| Grant date | Mar 25, 2008 |
| Priority date | — |
| Expiry date | Dec 2, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S2015/935
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The invention relates to a method for determining the position (x, y) of at least one point of reflection (R1-2) on an obstacle. According to traditional methods of this kind a first distance (r1) between the point of reflection (R1-2) and a first position (x1) of a distance measuring device is calculated by evaluating a time period between the emission of a transmission signal and reception of a reflection signal. In order to state the unsharp position of the point of reflection thereby obtained even more precisely, in addition to the first distance (r1), a second distance (r2) of the point of reflection is calculated with respect to a second position (x2) of the distance measuring device in analogy to the calculation of the first distance (r1) and then a defined position (x, y) is calculated from the pair of variates (x1, r1) (x2, r2) so obtained using the triangulation method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.