Method of producing anti-reflection film
US7351447B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 19, 2004 |
| Grant date | Apr 1, 2008 |
| Priority date | — |
| Expiry date | Sep 28, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/259
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of producing an anti-reflection film includes forming a first layer on a transparent substrate, forming a second layer on the first layer, and forming the third layer on the second layer. When an optical admittance Y at a surface of the second layer is represented by,where i is the imaginary number unit,thicknesses and reflective indexes of the substrate, first layer, second layer, and third layer are selected so that x and y satisfy the following formula,0.9x{(n2−n02)/2n0}2<{x−(n2+n02)/2n0}2+y2<1.1x{(n2−n02)/2n0}2 where n is a refractive index of the third layer and n0 is a refractive index of an outer region at an outside of the anti-reflection film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.