Patterning of indium-tin oxide (ITO) for precision-cutting and aligning a liquid crystal display (LCD) panel
US7351519B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Nov 23, 2004 |
| Grant date | Apr 1, 2008 |
| Priority date | — |
| Expiry date | May 14, 2025 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09K2323/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of improved patterning of indium-tin oxide (ITO) for precision-cutting and aligning a liquid crystal display (LCD) panel includes depositing a transparent ITO layer upon a transparent substrate, depositing a non-transparent plating layer upon the transparent ITO layer and depositing a photoresist layer upon the non-transparent plating layer. The photoresist layer is patterned, exposed and developed to form a plurality of photoresist lines. The photoresist lines are exposed again in an active area only and the plating layer is etched to form a plurality of non-transparent plated lines. The ITO layer is then etched to form a plurality of ITO lines. The photoresist lines are then developed and the non-transparent plated lines are etched away in the active area only. The photoresist that is outside the active area is then removed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.