Patent · US Expired

Method and phase mask for manufacturing a multi-channel optical grating

US7352931B1 · kind B1 · utility

9Cited by
8References
50Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 8, 2006
Grant dateApr 1, 2008
Priority date
Expiry dateMar 8, 2026

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B6/02138
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A method for manufacturing a complex multi-channel optical grating using a phase mask is presented. A plurality of sub-gratings is designed, each having an individual spectral response designed to produce one of the channels of the multi-channel grating. The target profile of the grating is determined based on the combination of the index profiles of the individual sub-gratings, the target index profile defining a target spectral response of the multi-channel grating. A modified index profile having a smooth apodization profile but providing the same spectral response as the target index profile, at least within a spectral region of interest, is determined and encoded into the phase mask. The phase mask is then used to photoinduce the grating in a photosensitive medium.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.