Guided-mode resonance filter and fabrication method of same
US7352932B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2007 |
| Grant date | Apr 1, 2008 |
| Priority date | — |
| Expiry date | Apr 27, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/136
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A silicon bulk-micromachining technology is used to fabricate a GMR filter by exploiting the structure of a suspended silicon nitride (SiNx) membrane on the silicon substrate. A first silicon nitride (SiNx) thin film and a second silicon nitride (SiNx) thin film are formed on opposite sides of the silicon substrate. A first opening is defined in the first silicon nitride (SiNx) thin film, and a grating structure is defined in the second silicon nitride (SiNx) thin film. By etching off a portion of the silicon substrate exposed from the first opening until a portion of the second silicon nitride (SiNx) thin film is exposed from the first opening, a light path space is defined.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.