Solvent removal apparatus and method
US7353623B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 20, 2005 |
| Grant date | Apr 8, 2008 |
| Priority date | — |
| Expiry date | Jan 26, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6715
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A solvent removal apparatus and method is provided that can dry a coat on a workpiece in a uniform thickness. The solvent removal apparatus includes a support base for supporting a substrate provided with a liquid phase film-forming coat containing a film material and a solvent, a gas introduction mechanism for introducing a solvent removal gas toward a center part of the substrate, and a flow restrictor for restricting flow of the solvent removal gas in such a manner that the gas can flow radially outward from the center part of the substrate toward a peripheral edge part thereof. The solvent is removed from the coat while restricting the flow of the gas with the flow restrictor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.