Method for thermal development of a photosensitive element using a development medium having a support
US7358026B2 · kind B2 · utility
10Cited by
20References
48Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2005 |
| Grant date | Apr 15, 2008 |
| Priority date | — |
| Expiry date | Sep 21, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/36
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
This invention relates to a method for thermally developing a photosensitive element to form a relief pattern. The method includes heating a composition layer of the element to cause a portion of the layer to liquefy and providing a development medium under tension to the element to absorb the liquefied composition. The development medium includes an absorbent material and a support, the combination of which minimizes stretch and distortion of the absorbent material and can impede the migration of the liquefied composition through the absorbent material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.