Apparatus for forming nanoholes and method for forming nanoholes
US7358193B2 · kind B2 · utility
1Cited by
4References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2004 |
| Grant date | Apr 15, 2008 |
| Priority date | — |
| Expiry date | Jun 6, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/334
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A vacuum chamber includes a plasma generating space in its interior. A magnetic field generating device applies a fluctuating magnetic field to the plasma generating space to cause plasma therein to fluctuate. A substrate is placed in the plasma generating space so that when a potential difference is evoked between a first conductor and a second conductor as a result of the fluctuation of the plasma, the potential difference causes nanoholes to be formed in the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.