Patent · US Expired

Far-field optical microscope with a nanometer-scale resolution based on the in-plane image magnification by surface plasmon polaritions

US7362440B2 · kind B2 · utility

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9Claims
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Key dates

Filing dateOct 24, 2005
Grant dateApr 22, 2008
Priority date
Expiry dateApr 26, 2026

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2021/178
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A far-field optical microscope capable of reaching nanometer-scale resolution using the in-plane image magnification by surface plasmon polaritons is presented. The microscope utilizes a microscopy technique based on the optical properties of a metal-dielectric interface that may, in principle, provide extremely large values of the effective refractive index neff up to 102-103 as seen by the surface plasmons. Thus, the theoretical diffraction limit on resolution becomes λ/2neff, and falls into the nanometer-scale range. The experimental realization of the microscope has demonstrated the optical resolution better than 50 nm for 502 nm illumination wavelength.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.