Method for removing developing solution
US7367725B2 · kind B2 · utility
0Cited by
5References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 20, 2005 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Nov 16, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0007
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus (3) for removing developing solution from a substrate (30) includes a working table (36) for placing the substrate, a supporting frame (33) positioned on the working table, a gas dispensing nozzle (31) mounted on the supporting frame, and a water dispensing nozzle (32) mounted on the supporting frame. The apparatus can remove the residual developing solution from the substrate and needs not to lift the substrate. The substrate is safely processed and the working time is improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.