Dynamic compensation system for maskless lithography
US7368207B2 · kind B2 · utility
3Cited by
3References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 31, 2006 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Mar 31, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70791
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for dynamically registering multiple patterned layers on a substrate (3) comprises: depositing a first layer on the substrate; printing a first pattern (20) on the first layer; depositing a second layer on the first pattern; and printing a second pattern on the second layer while dynamically detecting the first pattern to align the second pattern with the first pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.