Photopolymerizable composition
US7368224B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 3, 2003 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Sep 2, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/127
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The invention provides a photopolymerizable composition having a high photosensitivity, which comprises a metal complex of a squarylium compound, a radical generator, and a compound having at least one ethylenically unsaturated double bond.The photopolymerizable composition of the present invention is advantageously used for a visible laser recording material such as a PS (Presensitized Plate) for laser direct plate-making, a dry film resist, a digital proof, a hologram, or the like, a panchromatic sensitive material (e.g., a sensitive material for a color hologram and a sensitive material used for full-color display and containing a photopolymerizable composition in a microcapsule), paints, adhesives, and so on.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.