Multilayer MEMS device and method of making same
US7368228B2 · kind B2 · utility
1Cited by
5References
24Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 19, 2003 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Oct 12, 2025 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0197
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of creating a microelectromechanical systems (MEMS) device includes applying a layer of photoresist to a lower layer to create a multilayer MEMS device. The method includes transferring the layer of photoresist to the lower layer. The method can also include spincoating the photoresist onto a release layer, softbaking the spincoated photoresist to at least partially dry it, transferring the photoresist to form a layer of the multilayer MEMS device, and exposing the photoresist to light to crosslink it. The multilayer MEMS device includes a plurality of layers of photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.