Cavity ring-down spectrometer for semiconductor processing
US7369242B2 · kind B2 · utility
10Cited by
23References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 17, 2006 |
| Grant date | May 6, 2008 |
| Priority date | — |
| Expiry date | Jul 26, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8578
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus is provided for measuring a gas within a semiconductor thin film process. The apparatus includes an optical resonator disposed within an environment of the thin-film process, a tunable laser that excites the optical resonator at a characteristic frequency of the gas and a detector that detects an energy within the resonator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.