Apparatus for processing substrates and method therefor
US7371023B2 · kind B2 · utility
3Cited by
4References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 13, 2005 |
| Grant date | May 13, 2008 |
| Priority date | — |
| Expiry date | Apr 14, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/3092
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus (100) for processing substrates includes: a substrate cleaning device (20), which cleans the substrates with treating liquid; a developing device (40); and a treating liquid recovery system (30), which is connected with the cleaning device and the developing device. The treating liquid recovery system can convey the treating liquid from the cleaning device to the developing device. Thus the treating liquid that has been used in the cleaning device can be reused in the developing device. Therefore the apparatus can economize on treating liquid and reduce costs.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.