Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition
US7371503B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 9, 2004 |
| Grant date | May 13, 2008 |
| Priority date | — |
| Expiry date | Oct 7, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/123
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator.The sulfonium salt compound is shown by the following formula (I),wherein R1 represents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or —OR3 group, wherein R3 is a monovalent alicyclic hydrocarbon group, R2 represents a (substituted)-alkyl group or two or more R2 groups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and X− indicates a sulfonic acid anion.The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.