Integrated inspection system and defect correction method
US7371590B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 21, 2005 |
| Grant date | May 13, 2008 |
| Priority date | — |
| Expiry date | Nov 1, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/8422
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for the inspection of and a process for the correction of defects in a microreplicated optical display film manufacturing process. The process steps of manufacturing a master, a plurality of shims from the master, and a multiplicity of display films from each shim are integrated with a systemic defect identification and correction process. Each primary manufacturing step has its own inspection system and correction process where defect information for that step of the process is fed back and analyzed; and from that analysis the subprocess is adjusted to eliminate or reduce the detected defect. The systemic defect is identified as to its source and then fed back and analyzed in the correction step of the respective subprocess in order to cure the root of the defect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.