Manufacturing method of thin film transistor array panel using an optical mask
US7371592B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 19, 2005 |
| Grant date | May 13, 2008 |
| Priority date | — |
| Expiry date | Mar 31, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/00
Abstract
A method for manufacturing a thin film transistor array panel using a photo mask is provided. The photo mask includes: a transmitting area and a translucent area, wherein the translucent area includes a plurality of light blocking portions blocking light, and wherein the light blocking portions have a plurality of areas blocking different amounts of light. By using this type of photo mask, a substantially flat layer of photoresist film can be deposited even on top of an uneven surface to manufacture a thin film transistor array panel. The flat photoresist film reduces processing cost and enhances the reliability of the panel manufacturing process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.