Patent · US Active

Retro-reflective target wafer for a position determination system

US7373726B2 · kind B2 · utility

1Cited by
14References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 27, 2006
Grant dateMay 20, 2008
Priority date
Expiry dateNov 24, 2026

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B2210/303
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A target that is usable in a position determination system such as, for example, a wheel alignment system, is structurally stable over wide temperature ranges, protected from humidity and chemical contamination, and not subject to breakage. A layered target structure includes a substrate board, a retro-reflective layer formed on the substrate board, a transparent sheet overlaying the retro-reflective layer, and an opaque patterned layer between the a retro-reflective layer and the transparent sheet. The layered target structure may be secured a support assembly.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.