Exposed conductor system and method for sensing an electron beam
US7375345B2 · kind B2 · utility
2Cited by
5References
35Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2005 |
| Grant date | May 20, 2008 |
| Priority date | — |
| Expiry date | Jun 8, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A detector is disclosed for sensing an intensity of an electron beam generated along a path. An exemplary detector includes an exposed conductor attached to a support which is configured to locate the exposed conductor within a path of an electron beam; a grounded conductor isolated from the exposed conductor, the grounded conductor partly surrounding the exposed conductor to form a plasma shield having a window positioned at least in a direction of the electron beam path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.