In-situ large area optical strain measurement using an encoded dot pattern
US7377181B2 · kind B2 · utility
18Cited by
18References
14Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 10, 2006 |
| Grant date | May 27, 2008 |
| Priority date | — |
| Expiry date | Jul 28, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01L1/247
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method of measuring strain in a test specimen comprises the steps of placing a pattern of marks on a surface of the test specimen, wherein the pattern of marks includes a plurality of target marks and a plurality of sets of coded marks, using the sets of coded marks to identify locations of at least two of the target marks, and using a change in distance between at least two of the marks to determine strain in the test specimen. An apparatus that performs the method is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.