Grid-based resist simulation
US7378202B2 · kind B2 · utility
24Cited by
1References
6Claims
0Family size
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Key dates
| Filing date | Nov 29, 2006 |
| Grant date | May 27, 2008 |
| Priority date | — |
| Expiry date | Nov 29, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/68
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A grid-based resist simulator predicts how a wafer coated with one or more resist layers will develop when exposed with a mask pattern. Image intensity values are calculated at a grid of points on the wafer, and the image intensity points are analyzed with a resist simulator that produces a resist surface function. A threshold contour of the resist surface function defines how the mask pattern will print on a wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.