Antireflective hardmask composition and methods for using same
US7378217B2 · kind B2 · utility
13Cited by
5References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 4, 2006 |
| Grant date | May 27, 2008 |
| Priority date | — |
| Expiry date | Jan 30, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include: wherein
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.