Photoresist composition for multi-micro nozzle head coater
US7378230B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 5, 2004 |
| Grant date | May 27, 2008 |
| Priority date | — |
| Expiry date | Jan 5, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0048
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a photoresist composition for an MMN (multi-micro nozzle) head coater, more particularly to a photoresist composition comprising a novolak resin with a molecular weight ranging from 2000 to 12,000, a diazide photoactive compound, an organic solvent, and a Si-based surfactant for use in liquid crystal display circuits.The photoresist composition for liquid crystal display circuits of the present invention solves the stain problem, which occurs in MMN head coaters used for large-scale substrate glass, and improves coating characteristics, so that it can be utilized industrially and is expected to significantly improve productivity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.