Apparatus and method for sensing electromagnetic radiation using a tunable device
US7378655B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 9, 2004 |
| Grant date | May 27, 2008 |
| Priority date | — |
| Expiry date | Feb 26, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/001
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for manufacturing a sensing device, such as a bolometer device or other devices. The method includes providing a substrate, e.g., silicon wafer. The method includes forming a first reflection layer overlying the substrate and forming a first electrode layer overlying the substrate. The method includes forming a sacrificial layer overlying a portion of the first reflection layer and a portion of the first electrode layer. The sacrificial layer is patterned using photolithography techniques. The patterned sacrificial layer corresponds to a cavity region. The method also forms a second electrode layer overlying the sacrificial layer and forms an elastic layer overlying the patterned sacrificial layer. The elastic layer encloses the cavity region corresponding to the patterned sacrificial layer. The method releases the sacrificial layer to form an opening in the cavity region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.