Amorphous hydrogenated carbon film
US7381452B2 · kind B2 · utility
2Cited by
2References
15Claims
0Family size
Inventors
Key dates
| Filing date | May 8, 2002 |
| Grant date | Jun 3, 2008 |
| Priority date | — |
| Expiry date | Jul 17, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2918
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention concerns an improved process for the deposition of amorphous hydrogenated carbon film, more specifically an improved low temperature, low power and low vacuum cathodic sputtering process. The invention also concerns the film produced by said process and articles containing an amorphous hydrogenated carbon film coating.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.