Alignment tool for precise pattern transfer
US7382449B2 · kind B2 · utility
2Cited by
2References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 21, 2004 |
| Grant date | Jun 3, 2008 |
| Priority date | — |
| Expiry date | Oct 12, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/0024
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Multi-point confocal microscopy, bright field microscope imaging, computer-controlled positioning stages, and an algorithm for automated leveling are the basis for a powerful but simple tool for aligning stamps used in precise pattern transfer to substrates. The system is relatively inexpensive and brings a capability similar to that of a photolithographic mask aligner to the world of elastomeric-stamp-based lithography. Alignment of the stamp and substrate is possible without contact between the two before printing.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.