Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method
US7387865B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 20, 2004 |
| Grant date | Jun 17, 2008 |
| Priority date | — |
| Expiry date | Jun 30, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/127
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A composition containing a photoacid generator monomer and surfactant, and a method for synthesizing a compound on a substrate using the composition are provided. The method includes bonding a layer of first molecules having an acid labile protecting group to a solid substrate; coating a layer of the photoacid generator monomer composition according to the present invention on the layer of first molecules; exposing the composition layer to light and then heat-treating to remove the acid labile protecting group from the first molecules corresponding to the exposed portion; washing and removing the composition layer from the exposed and unexposed portions; and bonding second molecules to the exposed first molecules.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.