Solution and method for the treatment of a substrate, and semiconductor component
US7387872B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 22, 2005 |
| Grant date | Jun 17, 2008 |
| Priority date | — |
| Expiry date | Mar 30, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31993
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
An embodiment of the invention provides a method for the treatment of a substrate made of paper or a substrate containing paper as support material for a semiconductor component. In an embodiment, the substrate surface is contacted with a solution comprising at least one phenol-containing base polymer and/or copolymer and a crosslinker component. A polymer formulation deposits from the solution onto the surface. The solution may further include an acid catalyst. Embodiments include a semiconductor component formed according to the method of the invention.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.