Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings
US7390535B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 3, 2003 |
| Grant date | Jun 24, 2008 |
| Priority date | — |
| Expiry date | Jul 3, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T50/60
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chemical vapor deposition (CVD) system and method for applying an aluminide coating constituted by two or more extrinsic metal components on a jet engine component. The aluminide coating is capable of forming a protective complex oxide upon subsequent heating in an oxidizing environment. At least one of the extrinsic metals in the aluminide coating is provided as a first vapor phase reactant from a receptacle coupled by a closed communication path with the reaction chamber of the CVD system and free of a carrier gas. The aluminide coating is formed by the chemical combination of the first vapor phase reactant with a second vapor phase reactant either created in situ in the reaction chamber or supplied by a carrier gas to the reaction chamber from a precursor source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.