Exposure apparatus
US7391496B2 · kind B2 · utility
0Cited by
20References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 7, 2005 |
| Grant date | Jun 24, 2008 |
| Priority date | — |
| Expiry date | Oct 7, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67109
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus which exposes a substrate to a pattern. The apparatus includes a channel which causes pure water to flow as a coolant, a temperature adjustment unit which adjusts a temperature of the coolant flowing in the channel, and a UV sterilization unit which performs UV sterilization processing for the coolant flowing in the channel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.