Method for measuring the separation of extended objects in conjunction with an optical observation system and microscope for carrying out the same
US7394552B2 · kind B2 · utility
2Cited by
14References
61Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 29, 2002 |
| Grant date | Jul 1, 2008 |
| Priority date | — |
| Expiry date | Apr 2, 2025 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B2090/061
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Method and device for determining one or more Z distances from an object surface to a reference plane, for example the primary plane of the primary objective of a microscope. By projecting an optical pattern onto an object, and subsequently detecting and computationally evaluating the object's reflection of this pattern by means of an image processing unit, it is possible to obtain relief-like imaging of the object and to identify the individual Z distances, irrespective of the object's contouring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.