Method of making a plasma lamp
US7396271B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 26, 2005 |
| Grant date | Jul 8, 2008 |
| Priority date | — |
| Expiry date | Apr 26, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J61/827
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus and method for achieving desired spectral emission characteristics in plasma lamps is disclosed. The apparatus and method use multi-layer thin film optical interference coatings to selectively reflect a portion of the light such that it can be absorbed in the plasma. The multi-layer thin film coating is applied to any surface of the lamp, which substantially surrounds the plasma. The number and thickness of the layers in the coating are selected to ensure that significant portion of the selected light emitted from the plasma is reflected by the coating and absorbed by the plasma. The properties of the coating, reflectance, transmittance and absorption are determined as a function of plasma and lamp characteristics. These characteristics include the spectral emission characteristics of the plasma, the spectral absorption characteristics of the plasma, the physical dimensions of the plasma, the angular distribution of the light emitted from the plasma on the coating and the geometry of the coated surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.