Method of producing a device with a movable portion

US7396740B2 · kind B2 · utility

Assignee

• Fraunhofer-Gesellschaft zur förderung der angewandten Forschung e.V. · DE

Inventors

• Thor Bakke · Dresden, DE
• Martin Friedrichs · Dresden, DE
• Benjamin Völker · Dresden, DE
• Thomas Haase · Twinsburg, US

Key dates

• Filing date: Jan 20, 2006
• Grant date: Jul 8, 2008
• Expiry date: Aug 2, 2026

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B81C2201/019
• WIPO field: Micro-structural and nano-technology
• WIPO sector: Chemistry

Abstract

A method of producing a device with a movable portion spaced apart from a support wafer comprises a step of providing the support wafer having a structured surface and a further step of providing a device wafer with a backing layer and a device layer disposed thereon. Further, the method comprises the step of generating a first planarization layer from a first starting material on the support wafer with a first method to fill in the structures of the structured surface of the support wafer, whereby a surface with a first degree of planarization is obtained. Further, the method comprises a step of generating a second planarization layer from a second starting material on the planarized surface of the support wafer with a second method to obtain a surface with a second degree of planarization, which is higher than the first degree of planarization, wherein the first and second planarization layers can be removed together. Additionally, the support wafer is connected to the device wafer such that the device layer and the planarized surface of the support wafer are connected. Then, removing the backing layer of the device wafer is performed, followed by structuring the resulting struct…