Sulfonium salts
US7396960B2 · kind B2 · utility
5Cited by
2References
1Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2007 |
| Grant date | Jul 8, 2008 |
| Priority date | — |
| Expiry date | Mar 15, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC07D285/16
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
The present invention provides a sulfonium salt which can serve as a photo-acid-generator, the sulfonium salt not raising the problem of poor compatibility to a photoresist polymer having an acid-dissociable group. The sulfonium salt is represented by formula (1):wherein R1 represents a linear or branched C2 to C9 divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a linear or branched C1 to C3 hydrocarbon group; each of R6 and R7 represents an organic group; R6 and R7 may be linked together to form a divalent organic group; and X− represents an anion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.