Rapid process for the production of multilayer barrier layers

US7399500B2 · kind B2 · utility

Assignee

• Schott AG · DE

Inventors

• Matthias Bicker · Mainz, DE
• Stephan Behle · Gau-Odernheim, DE
• Lutz Klippe · Wiesbaden, DE
• Andreas Luttringhaus-Henkel · Darmstadt, DE
• Gregor Arnold · Bodenheim, DE

Key dates

• Filing date: Aug 7, 2003
• Grant date: Jul 15, 2008
• Expiry date: Sep 29, 2024

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/31681
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A process for applying alternating layers by chemical vapor deposition comprises the process steps of depositing an adhesion-promoter layer on a substrate and applying a barrier layer. Alternating layers comprising organic and inorganic materials are deposited alternately, and in this process the coating time for application of the adhesion-promoter layer is between 0.05 s and 4.0 s and the coating time for application of the inorganic barrier layer is between 0.1 s and 6.0 s. A composite material is also produced using the process.