Patent · US Expired

Curable resin for photo-patterning, process for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel

US7399574B2 · kind B2 · utility

5Cited by
8References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 26, 2002
Grant dateJul 15, 2008
Priority date
Expiry dateAug 26, 2024

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09K2323/05
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

Provided are a curable resin and a curable resin composition which have alkali-solubility and curability that can freely be adjusted and a high sensitivity, a liquid crystal panel substrate which can maintain an even cell gap, and a liquid crystal panel using the liquid crystal panel substrate to exhibit a superior display quality. A curable resin composition comprising an imide-containing copolymer having a molecular structure wherein a constitutional unit at least the following units are connected: a constitutional unit having a cyclic imide group represented by the formula (1), a constitutional unit having an acid functional group such as a carboxyl group; and a constitutional unit having a photopolymerizing functional group. In a liquid crystal panel substrate (color filter 103), plural spacers (column-shaped spacers 12) are disposed in a non-display region on a substrate 5.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.