Synthesis of photoresist polymers
US7399806B2 · kind B2 · utility
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107References
24Claims
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Assignee
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Key dates
| Filing date | Apr 12, 2007 |
| Grant date | Jul 15, 2008 |
| Priority date | — |
| Expiry date | Apr 12, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0046
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.