Method for monitoring particle size
US7400400B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2002 |
| Grant date | Jul 15, 2008 |
| Priority date | — |
| Expiry date | Jun 24, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/3563
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention provides methods for the use of visible and/or near-infrared spectroscopic methodology to monitor and control processes for the generation of particles, including processes that provide for a reduction in particle size and processes that result in an increase in particle size. One embodiment of the present invention employs visible and/or near-infrared diffuse reflectance spectroscopy to monitor particle size. The present invention is particularly useful for monitoring particle size of optically dense samples and is further useful for monitoring the endpoint of particle generation processes. In contrast to methods known in the art, the present invention is especially useful for on-line monitoring of particle size.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.