Abnormal pattern detecting apparatus
US7400758B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 31, 2003 |
| Grant date | Jul 15, 2008 |
| Priority date | — |
| Expiry date | Dec 23, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30068
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Diagnostic assistance to physicians is improved, by increasing detection rates of abnormal pattern candidates having radially extending linear structures, and decreasing false positive detection rates. A linear structure extracting means extracts linear structures from within radiation image of a subject. A linear concentration calculating means calculates linear concentrations of the extracted linear structures with respect to each pixel within the image. A directional distribution index calculating means calculates indices of directional distribution of the extracted linear structures with respect to each pixel of interest. A candidate region detecting means calculates products of the linear concentrations and the indices of directional distribution for each pixel of interest, and detects tumor pattern candidate regions based on the calculated products. Thereby, candidate regions are enabled to be extracted while taking into consideration variance in the directions of linear structures.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.