Patent · US Active

Method of fabricating a probe having a field effect transistor channel structure

US7402736B2 · kind B2 · utility

5Cited by
16References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 23, 2005
Grant dateJul 22, 2008
Priority date
Expiry dateAug 17, 2026

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/876
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A probe of a scanning probe microscope having a sharp tip and an increased electric characteristic by fabricating a planar type of field effect transistor and manufacturing a conductive carbon nanotube on the planar type field effect transistor. To achieve this, the present invention provides a method for fabricating a probe having a field effect transistor channel structure including fabricating a field effect transistor, making preparations for growing a carbon nanotube at a top portion of a gate electrode of the field effect transistor, and generating the carbon nanotube at the top portion of the gate electrode of the field effect transistor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.